Tekscend Photomask to Exhibit and Present at NNT 2026

Showcasing the Latest Nanoimprint Master Mold Manufacturing Technologies for Next-Generation Devices

Tekscend Photomask Corp. (Headquarters: Minato-ku, Tokyo; Representative Director, President and CEO: Teruo Ninomiya; hereinafter "Tekscend Photomask") will exhibit and present at NNT 2026, an international conference hosted by the Nanoimprint Technology Research Association of the Japan Society of Applied Physics.

The conference will be held over four days, from October 13 to 16, 2026, at Sendai Sunplaza in Sendai, Miyagi Prefecture. It brings together universities, research institutions, companies, and other organizations to present their research findings while sharing the latest developments in nanoimprint and nanoprint technologies. The conference covers a wide range of topics, from processes, materials, and equipment to applications in electronics, optics, biotechnology, and energy.

Tekscend Photomask will exhibit and present at the conference. At its booth, the company will showcase nanoimprint master molds enabled by state-of-the-art electron-beam lithography and innovative etching technologies, along with its nanoimprint prototyping and development services.

The presentation will focus on nanoimprint lithography (NIL), which is used to create precise nanoscale features essential for device performance, particularly in AR/VR optical components. It will introduce the master mold manufacturing technologies that underpin NIL, highlighting Tekscend Photomask's technologies for forming complex pattern shapes and profiles directly on master molds. The presentation will also explain how these technologies can simplify the nanoimprint lithography process.

Event Overview

Dates: October 13 (Tue) - October 16 (Fri), 2026
Venue: Sendai Sunplaza (5-11-1 Tsutsujigaoka, Miyagino-ku, Sendai, Miyagi)
Official Website: https://nanoimprint.jp/nnt2026/
*For more details, please visit the official event website.

Exhibition Information

Exhibition Dates: October 14 (Wed) - October 15 (Thu), 2026
Booth No.: 6

Presentation Information

Date & Time: October 15 (Thu), 2026, 12:05 p.m.-
Topic: NIL Mastering: Enabling the Next Generation of Nano Manufacturing

<Speaker Profile>
Name: Bríd Connolly
Marketing Manager at Tekscend Photomask, responsible for expanding photomask and 
lithography applications through product development and strategic alliances.
Has extensive experience in the photomask industry, having worked in process engineering, technical customer support, sales, technical marketing, business development, and product development for nanoimprint lithography applications.
Holds a degree in Applied Physics from Dublin City University.

About Tekscend Photomask Corp.

Tekscend Photomask Corp. is a leading manufacturer and supplier of photomasks, which are essential to semiconductor manufacturing. 
The company operates nine manufacturing sites across North America, Europe, Asia, and Japan, leveraging its global production network to provide a stable and reliable supply of photomasks.
With its advanced technological development capabilities, the company holds the No. 1 global market share in the merchant photomask market and contributes to the continued development of the semiconductor industry.
In addition, the company is expanding into microfabrication fields, including nanoimprint molds, building on the technologies and expertise cultivated through its photomask business. 

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The information contained in this news release is current as of the date of publication and is subject to change without notice.