Newsroom

Tekscend Photomask Expands Production Capacity in Europe with Strategic Photomask Writing Investment

Tekscend Photomask Japan Launches its new Nanoimprint Lithography line (NIL) Capabilities

Tekscend Photomask Establishes New MVV

Tekscend Photomask Signs Partnership Agreement with Shiga Lakes

Tekscend Photomask and IMS Nanofabrication Unveil Europe's First Multibeam Mask Writer at AMTC Dresden

Through Evolution of Semiconductors, We Strive to Solve Social Issues

Toppan Photomask to Rebrand as Tekscend Photomask

Toppan Photomask Signs Agreement with IBM for Joint R&D on Semiconductor EUV Photomasks

EV Group and Toppan Photomask join forces to accelerate market adoption of nanoimprint lithography for photonics manufacturing

Toppan Carves Out Semiconductor Photomask Business to Launch New Company