Research Library

Photomasks contributes in many ways to the advancement of the semiconductor and photomask industries. For example, in technology papers presented at leading industry conferences, we publish results from many of our key research programs.

For your convenience, listed below are links to published technology papers which Toppan Photomasks's researchers either authored or co-authored.

BACUS 2005 - [Oct 2005]
Doc ID	Paper Title	Pages
5992-10	Advanced manufacturing rules check (MRC) for fully-automated assessment of complex reticle designs	9
5992-31	Pattern Fidelity Performance from Next-Generation DUV Laser Lithography on 65nm Masks and Wafers	12
5992-57	Photomasks Registration Specification and Its impact on FLASH Memory Devices	7
5992-88	Design and Fabrication of Highly Complex Topographic Nano-imprint Template for Dual Damascene Full 3-D Imprinting	9
5992-120	Use of Excimer Laser Test System for Studying Haze Growth	11
5992-138	Design and Fabrication of Nano-imprint Templates Using Unique Pattern Transforms and Primitives	9

BACUS 2004 - [Sep 2004]
Doc ID	Paper Title	Pages
5567-26	High flow rate development: Process optimization using Megasonic Immersion Development (MID)	14
5567-168	Phase Standard Based on Profilometer Metrology Standard	7

Photomask Japan 2004 - [Apr 2004]
Doc ID	Paper Title	Pages
5446-19	Investigations on microloading effect: A parallel approach to PGSD (Proximity Gap Suction Development)	2
5446-31	Imaging Properties of a Leading-Edge DUV Laser Generated Photomask	9
5446-65	The study of Phase Angle Effects to Wafer Process Windows using 193nm EAPSM in a 300mm Wafer Manufacturing Environment	9

Microlithography 2004 - [Feb 2004]
Doc ID	Paper Title	Pages
5374-33	Architectural Choices for EUV Lithography Masks: Patterned Absorbers and Patterned Reflectors	11
5377-18	Study of OPC for AAPSM Reticles using Various Mask Fabrication Techniques	8

BACUS 2003 - [Sep 2003]
Doc ID	Paper Title	Pages
5256-02	DUV Mask Writer for BEOL 90nm Technology Layers	11
5256-04	DUV laser lithography for photomask fabrication	12
5256-19	OASIS vs. GDSII Stream Format Efficiency	11
5256-48	193nm Haze Contamination: A Close Relationship between Mask and its Environment	9
5256-76	Use of lower-end technology etch platforms for high etch loads	12
5256-107	Influence of Anti-Reflection Coatings in ArF Lithography	17
5256-108	Manufacturing of ArF Chrome-Less Hard Shifter for 65nm technology	11
5256-131	Immersion System Process Performance for 248nm and 193nm Photomasks – Binary and EAPSM	9

For papers related to Microlithography, Photomask Japan and BACUS forums:

These papers are made available as an electronic reprint (preprint) with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.