How a Photomask is Made
Mask Engineering
Chipmakers transmit the specifications for their designs to us through a variety of different media in a number a different languages. Each manufacturer, however, relies on our thorough understanding of their unique design needs, as well as our ability to rapidly produce photomasks with perfect accuracy.
It all begins with our ability to consistently produce a high-quality chrome mask that provides chipmakers with tight critical dimension controls at extremely low defect rates. This helps chipmakers build higher-performance products with greater yields. Below is an overview of the basic steps we at Toppan Photomasks take to produce a binary mask.
| HOW A PHOTOMASK IS MADE | ||||
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| 1 GENERATE PATTERN | 2 DEVELOP RESIST | 3 ETCH CHROME | ||
Convert circuit design data to image in resist through e-beam/laser exposure. |
Develop temporary pattern in resist to serve as a match for etching. |
Define permanent pattern in chrome. |
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| 4 REMOVE RESIST | 5 MEASURE CRITICAL |
6 MEASURE FEATURE |
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| 7 INITIAL CLEAN | 8 INSPECT FOR DEFECTS | 9 REPAIR | ||
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| 10 PRE-PELLICLE CLEAN | 11 APPLY PELLICLE | 12 AUDIT | ||
Our objective is to be the world's premier global supplier of photomasks, by providing the finest services and the most advanced technology to our customers. In addition to our industry-leading capabilities, we maintain a fleet of leading-edge tool sets and 10 separate facilities around the world that are strategically located near our customers. Thus our speed and flexibility complement our technology advances and ability to deliver the highest quality photomasks to our customers.











