We have developed many skills and competencies over the past decades while manufacturing photomasks. A critical raw material we use is the electronic layout. Forging designs into usable photomasks has germinated expertise in data modification and data correction. We offer this expertise within our Design Services.
Toppan's Technical Design Center (TDC) is a total semiconductor solution provider to bring your products to market. Our dedicated engineering staff has over 30 years of extensive experience in Digital, Mixed-signal, Analog, and Memory designs offering solutions down to the 40nm node and beyond. That experience, coupled with our extensive library containing both Toppan-owned and 3rd party IP, can assist in speeding development of your IC design. We also support system level development including board design.
Beyond our circuit design services, we offer a turn-key solution managing the entire design and manufacturing process for you. Starting with specifications, we produce the design and oversee the subsequent manufacturing, assembly, test and prototype evaluation. This service can be applied to any type of LSIs, ranging from small analog chips to large scale SoCs.
Toppan is a TSMC CyberShuttle® Alliance Partner, and we offer LSI prototype services utilizing this program. Our CyberShuttle experience assures that you will have seamless access to this cost-saving strategy.
Visit our Technical Design Center website to discover more.
Toppan provides Frame Generation Services that allow for flexible wafer layout of primary devices, process control monitors and electrical test structures. We help optimize the reticle layout to maximize the die output, or we can customize the layout to match your specifications.
At Toppan, we tackle problems systematically, and Frame Generation is no different. We create a customized Process of Record to meet your individual needs. Our Frame Generation Services rely on automated software that places the device patterns, generates the frame and scribes, runs Booleans and fills, and finally fractures and builds the jobdecks.
We also handle the complex layout requirements necessary to achieve MPWs and shuttle devices. This highly cost-effective approach is ideal for prototyping, and the Toppan Frame Generation Service gives you instant capability to use this sophisticated savings strategy.
Our experience in data handling for fracture and jobdeck creation using quality-driven processes has been extended to frame generation. With our Frame Generation Services, you can count on our established systems to provide seamless data verification all the way through to photomask delivery.
Toppan offers a comprehensive set of design-to-litho services for customers who do not have these capabilities, are searching for a lower cost solution, or desire a third-party backup and off-load partner. We provide a suite of services including OPC development and application, mask design, and lithography engineering. We can also transfer, test, qualify, run, and maintain your existing OPC recipes to provide either backup capabilities or cost reduction opportunities.
Outsourcing to us provides access to high quality, fast cycle mask synthesis capability with pay-per-use cost advantages. We offer multiple levels of service price points and flexible pricing models. We use leading edge, industry-standard lithography simulation and OPC tools combined with custom automation software that insures high quality. Our process seamlessly meshes with our mask manufacturing to ensure a smooth handoff and optimized cycle times.
We have over a decade of mask synthesis experience. From development through production, we have leveraged our well-known quality systems to establish customized automation delivering a world-class service. We extended our offering to include OPC and litho engineering solutions, and we now have nearly a decade of experience helping customers establish new lithography processes in support of their most advanced technology nodes. We support 250nm to 32nm nodes using both rules-based and model-based OPC methods. Our full-service solution also includes frame generation and MPW layout capabilities.
Most OPC problems are solved by first understanding and optimizing the lithography conditions. We emphasize the importance of having a solid lithographic foundation before adding OPC. We have diverse litho engineering experience spanning multiple technology nodes and various customer application spaces. Explore how we have helped customers solve their unique lithographic challenges.
The Toppan Turnkey OPC Service follows four simple steps. We will collaborate with your engineering staff using this well-tested process to develop a perfect OPC solution for you.