Toppan is a leader in the manufacture of high-quality, advanced binary photomasks across all regions worldwide. Our advanced binary dry-etch process provides superior CD and Registration uniformity, improved chrome side-wall profiles, enhanced image fidelity, and the option to use sophisticated OPC. We continually share best practices among our factories to eliminate defects and streamline our manufacturing. These ongoing efforts deliver improvements in wafer yields and product performance to our customers.
Advanced binary photomasks are primarily available on 6" Quartz substrates with specifications that can be fully customized to meet your specific needs. Some of our most common sizes and spec groupings are listed below.
Our Advanced Binary Masks support a broad range of OPC techniques that compensate for a variety of proximity effects including closed contacts or holes, shortened or rounded lines, local pattern density non-uniformities, topographic effects and many other limiting phenomena. Adding OPC features to our high-quality masks virtually eliminates proximity effects and results in improved resolution and process latitude. Because OPC is applied to the pattern data before it is printed onto the mask, we will work closely with your teams to develop the perfect product for your needs.
We leverage our Global Manufacturing Network to build and deliver your photomasks virtually anywhere. As businesses have separated their design groups from their manufacturing groups, Toppan has focused on providing flexible options to give you the best possible experience. We have more than just the flexibility and experience to ship locally, regionally, and internationally. Our Global Network also enables us to work closely with both the designer and the manufacturer, no matter how far apart they are.
We have over 100 years of printing heritage, and we've built our reputation one customer at a time. We keep our focus on you, because our success is linked to yours.