Toppan Photomasks Presents ASMC 'Best Paper Award' To Joint Team from IBM and KLA-Tencor
View the ASMC Best Paper – "As published in the 2005 IEEE/SEMI Advanced Semiconductor Manufacturing Conference proceedings, 11-12 April 2005, Munich, Germany. http://semi.org/asmc"
Toppan Photomasks, Inc. today will present a team from IBM Corp. and KLA-Tencor Corp. the "ASMC Toppan Photomasks Best Paper Award" during the 17 th Annual IEEE/SEMI® Advanced Semiconductor Manufacturing Conference (ASMC) at the Sheraton Boston Hotel.
The award marks the 11 th consecutive year that Toppan Photomasks, formerly DuPont Photomasks, has honored authors winning the ASMC best technical paper. The award is scheduled to be presented at 8:40 a.m. EDT, during the conference's opening session, in front of representatives from fabs from around the world.
The paper, entitled "Process-Window Sensitive Full-Chip Inspection for Design-to-Silicon Optimization in the Sub Wavelength Era," was written by MaryJane Brodsky (lead author), Scott Halle, Vickie Jophlin-Gut, Lars Liebmann and Don Samuels of IBM Microelectronics; and Gary Crispo, Kourosh Nafisi, Vijay Ramani, and Ingrid Peterson of KLA-Tencor. The award recognizes the team's collaborative and unique work toward improving the design-to-silicon flow.
"ASMC is a leading semiconductor forum for exchanging engineering expertise and discussing practical wafer-manufacturing issues," said Dr. Franklin Kalk, chief technology officer, Toppan Photomasks. "Toppan Photomasks' tradition of sponsoring and presenting this award emphasizes our dedication to support these technical forums and to recognize research excellence that will help advance technology and improve the productivity of fabs and foundries across the industry."
The best paper award is presented for exemplary research that advances semiconductor manufacturing processes and is chosen from more than 90 peer-reviewed technical papers by the ASMC Steering Committee and chairpersons of each session. The award-winning paper can be viewed at the Toppan Photomasks Web site at www.photomask.com.
About ASMC 2006
ASMC 2006 continues a long tradition of unveiling breakthroughs in semiconductor manufacturing —from fab productivity and profitability to advanced process controls and device yield. With more than 90 peer-reviewed technical papers, expert keynotes and a topical panel discussion, ASMC attracts engineers and managers from fabs around the world who want to advance their semiconductor manufacturing knowledge with real solutions … direct from the fab.
About Toppan Printing
Founded in 1900, Toppan Printing has branched into seven diverse business fields, including security cards, commercial printing, publications printing, packaging, industrial materials, electronics and optronics. In the fiscal year ended March 31, 2006, Toppan posted revenues of ¥ 1,548.2 billion (approximately US$ 13.2 billion) and ended the year with approximately 35,954 employees. For more information visit www.toppan.co.jp.
About Toppan Photomasks
Toppan Photomasks, Inc. is a wholly owned subsidiary of Toppan Printing Co., Ltd. a diversified global company with revenue in excess of $13 billion in fiscal 2006. Together with the photomasks business of Toppan Printing, the company forms the world's premier photomask provider. Utilizing operations within the industry's most advanced and largest network of manufacturing facilities, Toppan Photomasks offers a comprehensive range of photomask technologies and research and development capabilities to meet the increasingly sophisticated and divergent product-and-service requirements of the global semiconductor industry. Toppan Photomasks is headquartered in Round Rock, Texas. For more information visit www.photomask.com.
Company Contact
Tom BlakeToppan Photomasks, Inc.
Tel: (512) 310-6562
tom.blake@photomask.com