News

 

Details on Toppan Printing's Next-Generation EUV Photomask

Toppan Printing Co., Ltd. has developed a next-generation EUV photomask for leading-edge semiconductors. The new photomask minimizes the unwanted reflection of light to peripheral sections during EUV exposure,*1 a next-generation semiconductor manufacturing technology. (continued)

Tokyo, Japan

Dr. Franklin Kalk, CTO of Toppan Photomasks, Inc., Honored With BACUS Lifetime Achievement Award

Toppan Photomasks, Inc. (TPI), the world’s preferred global partner for photomasks, announced today that Dr. Franklin Kalk, Chief Technology Officer, was honored at this year’s SPIE Photomask Technology conference with a Lifetime Achievement Award. This award is given in recognition for his significant contributions to the photomask industry and his leadership in developing cutting edge infrastructure. (continued)

Round Rock, TX

Toppan Printing to Launch New Production Line for FC-BGA Substrates

ROUND ROCK, Texas — January 14, 2014 — Toppan Printing Co., Ltd. today announced it plans to expand its flip-chip ball grid array (FC-BGA) substrate business by establishing a new production line at the company's Niigata plant in (Shibata City, Niigata Prefecture, Japan). (continued)

Round Rock, TX

Toppan Photomasks and GLOBALFOUNDRIES extend joint venture and make further capital investment at Dresden Advanced Mask Technology Center

Toppan Photomasks, Inc. (TPI) and GLOBALFOUNDRIES Inc. today announced that they have executed definitive agreements to extend the Advanced Mask Technology Center (AMTC) joint venture in Dresden, Germany at least through 2017. The AMTC provides leading-edge photomasks to GLOBALFOUNDRIES and to TPI's European and global customer network. (continued)

ROUND ROCK, Texas, and MILPITAS, Calif.