News
Toppan Photomasks and GLOBALFOUNDRIES extend joint venture and make further capital investment at Dresden Advanced Mask Technology Center
Toppan Photomasks, Inc. (TPI) and GLOBALFOUNDRIES Inc. today announced that they have executed definitive agreements to extend the Advanced Mask Technology Center (AMTC) joint venture in Dresden, Germany at least through 2017. The AMTC provides leading-edge photomasks to GLOBALFOUNDRIES and to TPI's European and global customer network. (continued)
Wed Dec 12, 2012 ROUND ROCK, Texas, and MILPITAS, Calif.
Toppan Photomask is Increasing the Capacity and Technology Capabilities of its Shanghai Manufacturing Joint Venture
Toppan Photomasks, Inc., a subsidiary of Toppan Printing Co., Ltd. today announced plans to expand its Shanghai manufacturing operation to better serve China's rapidly growing semiconductor industry. (continued)
Fri Nov 18, 2011 Shanghai, China
SSMC Honors Toppan Photomask With Best Supplier Award For Outstanding Service in 2010
New award is Toppan's fourth in six years; criteria included technology, support, quality and responsiveness (continued)
Tue May 17, 2011 Round Rock, TX
Toppan Photomasks Again Receives Supplier Excellence Award From Texas Instruments
Honor recognizes exceptional performance and continuous improvement. This 2010 award is the 4th received by Toppan. (continued)
Tue Apr 19, 2011 Round Rock, TX
Toppan Printing Enters into Extended Agreement with IBM for 14nm Photomask Process Development
Toppan Printing Co., Ltd. announced today that it has extended a joint development agreement with IBM for leading-edge photomask process, covering the 14 nanometer technology node for logic devices. (continued)
Mon Jan 17, 2011 Tokyo
Toppan Receives Supplier of the Year Award From TowerJazz
Award recognizes outstanding global support and service from Toppan's international technology and manufacturing network (continued)
Tue Nov 30, 2010 Round Rock, TX
Toppan Completes 22nm and 20nm Production Photomask Process through Toppan-IBM Joint Development
Toppan Completes 22nm and 20nm Production (continued)
Thu Sep 09, 2010 Tokyo
Toppan Photomasks and GLOBALFOUNDRIES Form Joint Venture at Dresden Advanced Mask Technology Center
Toppan Photomasks, Inc. (TPI) and GLOBALFOUNDRIES today announced that they have formed a joint venture for operation of the Advanced Mask Technology Center (AMTC) in Dresden, Germany. The joint venture will provide leading-edge photomasks to GLOBALFOUNDRIES and to TPl's European and global networks of customers. (continued)
Tue Jan 19, 2010
Toppan Printing Completes 32nm and 28nm Production Photomask Process through Toppan-IBM Joint Development
Toppan Printing Co., Ltd. has established a new and improved photomask manufacturing process in April 2009 at its photomask facility in Asaka, Japan, to support 32nm and 28nm semiconductor device production. (continued)
Tue Apr 21, 2009 Tokyo
Toppan Printing Enters into New Photomask Process Development Agreement with IBM
New Collaboration to Include Early Establishment of 22nm Photomask Process (continued)
Thu Jun 19, 2008 Tokyo
Toppan Printing is the World's First Photomask Manufacturer to Establish 32nm-Capable Photomask Manufacturing Process
Process, which Shortens Mask Cycle Time and Controls Costs, Starts Volume Production in June (continued)
Thu Jun 12, 2008 Tokyo
Toppan Printing Receives 'Supplier Excellence Award'
TI Cites Photomask Maker's Performance in Cost, Environmental Responsibility, Technology, Responsiveness, Assurance of Supply and Quality (continued)
Wed May 07, 2008 Tokyo
Toppan Photomasks Receives 'Top 10 Best Supplier Award' From CSMC
Toppan Is First Mask Maker to Receive Chinese Foundry's Highest Award (continued)
Mon Mar 17, 2008 Round Rock, TX
Toppan Photomasks and Anchor Semiconductor Announce Advanced DFM Tool
Toppan Photomasks and Anchor Semiconductor Announce Advanced DFM Tool for Review and Dispositioning of Design Errors, Manufacturing Rule Violations and Defects. Multiple Benefits Include Reduced Risk, Improved Cycle Time and Comprehensive Evaluation to Help Customers Decide Disposition of Defects. (continued)
Wed Feb 27, 2008 Round Rock, TX and Santa Clara, CA
